The International Symposium on Physical Design (ISPD 2008) revealed the current trends in chip design and fabrication--and there were some surprising finds.

As part of a joint development effort, Brion Technologies, an ASML company, and Dai Nippon Printing Co. Ltd claimed they have demonstrated model-based photomask verification on critical 45-nanometer logic masks. The development work was conducted in collaboration with STMicroelectronics in

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